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Vacuum Radio Frequency Plasma Purgatio Equipment

Plasma purgatio instrumenti superficies productas praeparat per activum, emundationem, enigmata et photoresist remotionem. Hic processus superficies humidabilitatem auget, adhaesionem efficiens, plating et compaginem operationum amplificat, et contaminantes ut oleum et residua organica efficaciter removet.
 
 
Availability:
Quantitas:
  • PTC-CCP110

  • PTC



Overview ​ 


 Certam superficiem praetractationem praebet pro processibus criticis inter impressiones, tunicas, laminas, et encapsulationes, dum communes quaestiones quasi adhaesio pauperis, tunicae inaequalis, et compaginem infirmam alloquitur. Praeterea plasma purgatio praebet eco-amicam, efficientem, et moderabilem optionem aridam ad traditionales modos solvendo-substructio purgandos.


  Compositio ​ 


Maxime ex vacui cubiculi, laminae electrode, frequentiae radiophonicae (RF) copiae potentiae, matcher et sentinae vacuum.



Features ​ 


  • Temperatus & celeris processus: Operatur apud cella temperies (<50°C) cum brevibus cyclis temporibus, impediendo damnum materiae sensitivae calori.

  • Superior purgatio: contaminantes removet ad level≤0.1nm, transcendens limites emundationis modos traditorum infectum.

  • Eco-amica & arida processum: eliminat chemica menstrua et wastewater; utitur iners / reactivum gasorum sine toxico generando per-products.

  • Intelligentes & deprauabiles: Features processus callidi control cum plena productione data traceability.


           Processus perfomance ​


                             001002



                                     ante curationem , angulus contactus = 85,6° post curationem , angulus contactus = 14.3°




Specifications Technical ​ 


Cubiculum capacitatis

110L

Cubiculum magnitudine  525(W)×445(D)×495(H)mm
Power range Continuo adjustable ex 0-600W, praecisione ± 1%
Radio frequentia 13.56MHz ± 0.05%
Celeritas processus III ~ X minuta (re ad dispensando perficiendi)
Post-dispensando perficiendi Aquae contactus angulus<15°
Compositus modus Impedimentum dui matching network
Electrode type Parallela lamina capacitiva coitus
Electrode materia Anodized aluminium

Configuratione laminam Electrode

Horizontalis, 4 electrodes (numerus stratorum horizontalium electrode vel altitudo componi potest)

Cassette loading is available

Electrode determinatio methodi

Obturaculum-in delapsum

Vacuum sentinam

Vane mechanica sentinam gyratorius

Elit celeritas

60m³/h

Ultimum vacuum gradum

≤5Pa

Vacuum range operating

10-100Pa

Channel numerus processus gas

canales sacra II. Plures canales ad libitum

Gas types Ar, O₂, N₂, H₂. Corrosivum gas CF₄ est libitum
Gas modum imperium Missa O Controller (MFC)
MFC measurement range ac accurate 0-300 sccm, accuratione ± 2% FS
Ipsumque loading magnitudine 400mm(L)*473mm(W)
Apparatus magnitudine 900(W) ×1100(D)×1750 (H)mm (exclusa altitudine tri-coloris lucis)
apparatu pondus De 450KG



area A application  

2




Semiconductor packaging (de-gluing, activation superficiei), fabricandi chip ductus, 3C electronics, Tabula circuli, Biomedicina, Nova vis, aviatio militaris.



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Contactus Info

Telephone : +86-512-5792-5888
: Email sales@ptcstress.com
Oratio  : No.581, Hengchangjing Road, Zhoushi Urbs, Kunshan urbs, Jiangsu Provincia, 215337, China

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